Photoreactive 3D printing material
Resistant to flammability, smoke and toxicity
Since announcing their collaboration in February 2019, Henkel and Origin have worked to develop new materials that overcome current limitations in additive manufacturing by optimizing printing processes. As a result of this partnership, Henkel is now launching a novel 3D printable photopolymer for Origin One printers that is resistant to flammability, smoke and toxicity.
The new photoreactive material is currently being presented at Formnext in Frankfurt. It meets both the UL 94-0 fire, smoke and toxicity standards for flame-retardant 3D printing materials and the industry-leading 12 and 60 second vertical fire tests for aerospace applications. The product is expected to set new standards for the flammability, smoke and toxicity resistance of 3D printing materials in numerous markets such as the aerospace and automotive industries.
Henkel has set itself the goal of overcoming limitations in the field of additive manufacturing. By combining software, data analysis and chemical formulations, the company is bringing new industrial production quality materials for 3D printing to the market. With the introduction of its open material platform, it is also pursuing a more integrative approach and working directly with printer manufacturers and system providers for new applications.
The new material demonstrates the potential of open collaborations in 3D printing. The development is also based on the performance characteristics of the Origin One printer. Origin's technology enables 3D printing of a variety of different chemical formulations with excellent equipment technology, printing process control and software tools for fine-tuning the printing process. With its programmable photopolymerization technology (P³), the company can precisely match light, temperature and other conditions and automatically optimize prints in real time for the best possible results.
You can see a video about the development and properties of the material here.
Formnext: Hall 12.1, Stand C41
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